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EUV lithography restrictions on China must continue, Trump aide says
May 23 (Reuters) - Restricting the sale of extreme ultraviolet (EUV) lithography equipment to China is the "single most important export control" the United States has in the area of semiconductors, the White House's AI and crypto czar David Sacks said on Friday. "The first Trump administration began the restriction, and it's of paramount importance that it continues," Sacks wrote on X. Dutch company ASML (ASML.AS), opens new tab makes EUV chipmaking machines, which produce the most sophisticated semiconductors. Lithography systems use beams of light to help to create the chip circuitry. ASML's first generation of EUV systems, currently used to make most chips in smartphones and AI chips, use light in the "extreme ultraviolet" wavelength to create design features down to 13 nanometres in resolution, smaller than a virus. Reporting by Rami Ayyub; Editing by Mark Porter, Kirsten Donovan Our Standards: The Thomson Reuters Trust Principles., opens new tab Suggested Topics:China
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EUV Lithography Restrictions on China Must Continue, Trump Aide Says
(Reuters) -Restricting the sale of extreme ultraviolet (EUV) lithography equipment to China is the "single most important export control" the United States has in the area of semiconductors, the White House's AI and crypto czar David Sacks said on Friday. "The first Trump administration began the restriction, and it's of paramount importance that it continues," Sacks wrote on X. Dutch company ASML makes EUV chipmaking machines, which produce the most sophisticated semiconductors. Lithography systems use beams of light to help to create the chip circuitry. ASML's first generation of EUV systems, currently used to make most chips in smartphones and AI chips, use light in the "extreme ultraviolet" wavelength to create design features down to 13 nanometres in resolution, smaller than a virus. (Reporting by Rami Ayyub; Editing by Mark Porter, Kirsten Donovan)
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EUV lithography restrictions on China must continue, Trump aide says
(Reuters) -Restricting the sale of extreme ultraviolet (EUV) lithography equipment to China is the "single most important export control" the United States has in the area of semiconductors, the White House's AI and crypto czar David Sacks said on Friday. "The first Trump administration began the restriction, and it's of paramount importance that it continues," Sacks wrote on X. Dutch company ASML makes EUV chipmaking machines, which produce the most sophisticated semiconductors. Lithography systems use beams of light to help to create the chip circuitry. ASML's first generation of EUV systems, currently used to make most chips in smartphones and AI chips, use light in the "extreme ultraviolet" wavelength to create design features down to 13 nanometres in resolution, smaller than a virus. (Reporting by Rami Ayyub; Editing by Mark Porter, Kirsten Donovan)
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David Sacks, the White House's AI and crypto czar, stresses the importance of maintaining restrictions on the sale of extreme ultraviolet (EUV) lithography equipment to China, calling it the most crucial export control in the semiconductor industry.
David Sacks, the White House's AI and crypto czar, has emphasized the critical importance of maintaining restrictions on the sale of extreme ultraviolet (EUV) lithography equipment to China. In a statement on Friday, Sacks declared this export control as the "single most important" measure in the semiconductor industry
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.Source: Reuters
Sacks, writing on the social media platform X, stressed the necessity of continuing these restrictions, which were initially implemented during the Trump administration. He stated, "The first Trump administration began the restriction, and it's of paramount importance that it continues"
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.EUV lithography is a cutting-edge technology crucial for producing the most advanced semiconductors. The process involves using beams of light to create intricate chip circuitry. The Dutch company ASML is at the forefront of this technology, manufacturing EUV chipmaking machines that are essential for producing state-of-the-art semiconductors
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.ASML's first generation of EUV systems employs light in the "extreme ultraviolet" wavelength to achieve remarkable precision in chip design. These systems can create features as small as 13 nanometers in resolution, which is smaller than a virus
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.The applications of this technology are far-reaching. EUV lithography is currently used to manufacture most chips found in smartphones and AI chips, underscoring its importance in the rapidly evolving fields of mobile technology and artificial intelligence
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The emphasis on maintaining these restrictions highlights the ongoing technological competition between the United States and China. By limiting China's access to EUV lithography equipment, the U.S. aims to maintain its technological edge in the semiconductor industry, which is crucial for various sectors including defense, telecommunications, and artificial intelligence
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.This stance also underscores the broader trend of technology decoupling between the two nations, as both seek to secure their supply chains and technological capabilities in critical areas. The continuation of these restrictions could have significant implications for global semiconductor supply chains and the development of advanced technologies in China.
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